CASPR Medik

Disinfection for Every Surface, Every Second, Everywhere

CASPR provides safe, continuous protection by reducing clinically relevant pathogens on all surfaces throughout your healthcare facility. It can be used safely in occupied spaces, with no need to remove staff and patients or to seal rooms.

CASPR Medik

CASPR Medik™ is our medical-grade solution that provides constant, stable levels of hydrogen peroxide to targeted areas. Units are inserted into existing HVAC ducts where they will reacts with your ambient air to create low levels of hydrogen peroxide (between .02 and .03 ppm). These molecules then circulate the air, land on all surfaces, and actively reduce micro-burdens as soon as contamination occurs. CASPR’s continuous nature allows us to not only reduce the Colony Forming Units (CFUs) but it keeps them down by preventing them from multiplying in-between episodic cleaning and disinfecting.

No-Touch Technology
That’s Truly No-Touch

CASPR Medik allows you to protect your patients and staff from the moment they step foot into your facility. CASPR’s continuous air and surface pathogen reduction technology offers no touch, facility-wide, enhanced disinfection. CASPR is safe to use in occupied spaces and has helped hospitals improve their throughput times and reduce employee absenteeism by over 40%. To learn more about our technology, review the latest whitepaper.

 CASPR Medik Ultraviolet LightHydrogen Misters
Proven effective against a broad spectrum of clinically relevant pathogensYesYesYes
Continuous pathogen reductionYesNoNo
Safe to use in occupied spacesYesNoNo
No disruption or delayed access to clinical areasYesNoNo
Continuously eliminates odorsYesNoNo
No operator required (true "No-Touch")YesNoNo
No capital expenditureYesNoNo
No sensitive use parametersYesNoNo

Proven Results

CASPR has been proven effective against relevant pathogens in both independent laboratory settings and hospital trials. In our latest studies, we were able to reduce employee absenteeism by 42% year-over-year at one hospital and reduce HAIs by 53% at another hospital.

  • MRSA
  • Clostridium difficile
  • VRE
  • Aspergillus Niger

To request lab and hospital results or to obtain a copy of our peer-reviewed and authored ICHE publication, contact us by clicking the link below.

Customer Testimonials

“You couldn’t ask for anything better. CASPR is continuous disinfection. You don’t have to have the staff involved because it is no-touch. It is completely automated.” – Lori Townsend, MSN, CIC, CPHQ

“We were interviewing companies that would be an adjunct to our Infection Control program and this company stood out for many reason. Their technology was hands down the best in the fact that it is non-invasive and the particles are able to get to areas that no other technology could. This technology has improved our patient safety and facility. Our culture results have shown a dramatic decrease in the amount of bioburden and that has impacted our surgical site infections and we have had less employees getting sick.” – Elizabeth Hardy, R.N., B.S.N.

“CASPR gave me the confidence to start seeing patients in my office, again. It is good to know that our air and surfaces are continually being treated. And, knowing that my patients are as safe as they can be gives me peace of mind.” – Suzanne Slonim, MD

CASPR Medik Overview

Third Party Research

Vital Signs: Preventing Antibiotic-Resistant Infections in Hospitals — United States, 2014

Lindsey M. Weiner, MPH; Scott K. Fridkin, MD; Zuleika Aponte-Torres, MPH; Lacey Avery, MA1; Nicole Coffin, MA; Margaret A. Dudeck, MPH; Jonathan R. Edwards, MStat; John A. Jernigan, MD; Rebecca Konnor, MPH; Minn M. Soe, MBBS, MPH; Kelly Peterson; L. Clifford McDonald, MD

Enhanced terminal room disinfection and acquisition and infection caused by multidrug-resistant organisms and Clostridium difficile (the Benefits of Enhanced Terminal Room Disinfection study)

Dr Deverick J Anderson, MD, Luke F Chen, MBBS, Prof David J Weber, MD, Rebekah W Moehring, MD, Sarah S Lewis, MD, Patricia F Triplett, et al.